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Microcathodoluminescence and Electron Beam Induced Current Observation of Dislocations in Freestanding Thick n-GaN Sample Grown by Hydride Vapor Phase Epitaxy

机译:微阴极发光和电子束感应电流观察氢化物气相外延生长的独立厚n-GaN样品中的位错

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摘要

Microcathodolumunescence (MCL) spectra measurements, MCL and electron beam induced current (EBIC) imaging of the freestanding n-GaN samples grown by hydride vapor phase epitaxy were made. Dark-spot defects in plan-view EBIC and MCL images and dark line defects in MCL images taken on the cleaved surface of the samples could be associated with dislocations. MCL spectra measurements in the vicinity of dislocations and in the matrix do not reveal specific luminescence bands that could be attributed to dislocations but rather suggest that dislocation regions have higher density of deep nonradiative traps.
机译:对氢化物气相外延生长的独立n-GaN样品进行了微阴极荧光(MCL)光谱测量,MCL和电子束感应电流(EBIC)成像。平面图EBIC和MCL图像中的暗点缺陷以及在样品的劈开面上拍摄的MCL图像中的暗线缺陷可能与位错相关。位错附近和基体中的MCL光谱测量结果并未揭示可归因于位错的特定发光带,而是表明位错区域具有较高的深非辐射阱密度。

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